Alignment Technologies and Applications of Liquid Crystals by Kohki Takatoh, Masanori Sakamoto, Ray Hasegawa, Mitsushiro

By Kohki Takatoh, Masanori Sakamoto, Ray Hasegawa, Mitsushiro Koden, Nobuyuki Itoh, Masaki Hasegawa

Written through a bunch of authors, who've released largely within the overseas learn literature, the ebook takes a close examine a severe element of Liquid Crystal expertise - the alignment features and homes of the fabrics utilized in the development and use of LCDs. The e-book examines the chemical, actual and mechanical homes of the fabrics and relates them to functional functionality concerns within the glossy Liquid Crystal. This authoritative sourcebook might be of significant price for all concerned about the sensible and theoretical problems with alignment phenomena in Liquid Crystals.

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Extra resources for Alignment Technologies and Applications of Liquid Crystals

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And  are the number of times a location is rubbed, the diameter of the cylinder, the rotational speed of the cylinder, and the movement speed of the substrate stage, respectively. This equation is almost the same as Uchida’s except that it does not include the contact length l. Since the rubbing pressure is constant, the rubbing density does not include this parameter. In these equations, the rubbing strength is proportional to the number of times a substrate is rubbed. However, this relationship holds only in the weak rubbing regime.

Believed that the asymmetric distribution of the side chains was the main mechanism causing the pretilt angle of the LC based on the results of the SHG measurements [52]. The relationship between the rubbing strength and the pretilt angle of the LC depends on the alignment materials. In some cases, the pretilt angle decreases with increase in rubbing strength. In other cases, it increases with increase in rubbing strength and decreases after showing a peak [62]. Nishikawa et al. calculated the molecular conformation, and explained these phenomena by using the model shown in Fig.

In this equation, l increases with rubbing pressure as controlled by the gap between the roller and the substrate, and the rubbing pressure is included in this contact © 2005 Kohki Takatoh, Masaki Hasegawa, Mitsuhiro Koden, Nobuyuki Itoh, Ray Hasegawa and Masanori Sakamoto Rubbing Technologies: Mechanisms and Applications 27 Gap between roller and stage Roller rotation speed Movement speed of platform Fig. 20 Structural sketch of a rubbing machine. A rubbing machine consists of a roller covered by rubbing cloth, and a platform to hold the substrate.

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